| 2002 | Surface and Coatings Technology |
The effect of plasma exposure and annealing atmosphere on shallow junction formation using plasma source ion implantation
| 5365 |
| 1993 | Journal of Vacuum Science & Technology |
Role of contaminants in electron cyclotron resonance plasmas
| 5386 |
| 2016 | Fusion Engineering and Design |
Deuterium ion irradiation induced blister formation and destruction
| 5557 |
| 2001 | Journal of applied physics |
Electrostatic probe diagnostic of a planar type radio-frequency inductively coupled oxgen plasma
| 5650 |
| 2006 | Journal Of The Korean Physical Society |
Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models
| 5697 |
| 2009 | Journal of Applied Physics |
Plasma uniformity and phase-controlled etching in a very high frequency capacitive discharge
| 5747 |
| | |
3-5mm 강판절단용 아크 플라즈마 절단기 팁 개발
 | 5919 |
| 1995 | Physics of Plasmas |
Magnetic and Collisional Effects on Presheaths
| 5964 |
| 2000 | Plasma sources science & technology |
Asymmetric plasma potential fluctuation in an inductive plasma source
| 6003 |
| 2009 | Journal of the Korean Physical Society |
A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma
| 6011 |
| 2006 | Transactions on Electrical and Electronic Materials |
SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge
| 6051 |
| 2008 | Review of Scientific Instruments |
Self-consistent circuit model for plasma source ion implantation
| 6104 |
| 2014 | Journal of Physics D: Applied Physics |
Standing wave effect on plasma distribution in an inductively coupled plasma source with a short antenna
| 6220 |
| 2004 | Key Engineering Materials |
Measurement of Monodisperse Particle Charge in DC Plasma
| 6274 |
| 2009 | Journal of Vacuum Science & Technology |
Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor
| 6389 |
