| 1999 | Physics of Plasma |
Ion sheath expansion for a target voltage with a finite risetime
| 8615 |
| 2012 | PLASMA SOURCES SCIENCE AND TECHNOLOGY |
Characteristics of vapor coverage formation on an RF-driven metal electrode to discharge a plasma in saline solution
| 9616 |
| 2001 | Surface & Coating Technology |
Measurement of sheath expansion in plasma source ion implantation
| 9761 |
| | |
유도 결합형 Ar/CH4 플라즈마를 이용한 ITO의 식각 특성에 관한 연구
 | 9923 |
| 2009 | Journal of Korean Physical Society |
Electron Density Monitoring By Using the V-I Phase Difference with a Circuit Model for a kHz Atmospheric-Pressure Dielectric Barrier Discharge
| 10078 |
| 2014 | Applied Science and Convergence Technology |
Monitoring Ion Energy Distribution in Capacitively Coupled Plasmas Using Non-invasive Radio-Frequency Voltage Measurements
| 10696 |
| 2015 | Journal of Physics D: Applied Physics |
How to determine the relative ion concentrations of multiple-ion-species plasmas generated in the multi-dipole filament source
| 12026 |
| 2001 | Journal of the Korean Physical Society |
Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma
| 16371 |
| 2018 | IEEE Transactions on Semiconductor Manufacturing |
Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables
| 28206 |
| 2012 | JOURNAL OF APPLIED PHYSICS |
Fabrication of single-walled carbon nanohorns containing iodine and cesium
| 41222 |
| 2001 | Current Applied Physics |
Calculation of transport parameters in KT-1 tokamak edge plasma
| 83224 |
| 2002 | Journal of Applied Physics |
Measurement of expanding plasma sheath from a target baised by a negative pulse with a fast rise time
| 103732 |
