연도 저널명 제목 조회 수
1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5385
2009  Journal of Vacuum Science & Technology  Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor 6374
2013  Journal of Thermal Spray Technology  Effect of Helmholtz Oscillation on Auto-shroud for APS Tungsten Carbide Coating 3353
2021  Journal of the Korean Physical Society  Phenomenology-based Model Predictive Control of Electron Density in Ar/SF6 Capacitively Coupled Etch Plasma 321
2022  Journal of the Korean Physical Society  Plasma Information-based virtual metrology (PI-VM) and mass production process control file 685
2016  Journal of the Korean Physical Society  Observation of Oversaturation-Induced Defect Formation in Tungsten Irradiated by Low Energy Deuterium Ion 947
2016  Journal of the Korean Physical Society  Effects of Metastable Species in Helium and Argon Atmospheric Pressure Plasma Jets (APPJs) on Inactivation of Periodontopathogenic Bacteria 1815
2014  Journal of the Korean Physical Society  Characteristics of a Non-Maxwellian Electron Energy Distribution in a Low-pressure Argon Plasma 1908
2012  Journal of the Korean Physical Society  Field Emission Characteristics of Cone-shaped Carbon-nanotube Bundles Fabricated Using an Oxygen Plasma 4937
2006  Journal Of The Korean Physical Society  Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models 5697
2009  Journal of the Korean Physical Society  A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma 6003
2006  Journal of the Korean Physical Society  Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor 6535
2006  Journal of the Korean Physical Society  Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process 7306
2001  Journal of the Korean Physical Society  Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma 16366
2017  Journal of Physics D: Applied Physics  Optical Diagnostics for Highly-populated Tail of Electron Energy Distribution Function in Very-High-Frequency Capacitively Coupled Plasma Using Spin- and Dipole-forbidden Lines 3803

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