| 2015 | Fusion Science and Technology |
Characterization of Two–Radiofrequency–Driven Dual Antenna Negative Hydrogen Ion Sources
| 1360 |
| 2015 | Fusion Science and Technology |
Laser-Assisted Ha Spectroscopy for Measurement of Negative Ion Density in A Hydrogen Plasma
| 935 |
| 2015 | Fusion Science and Technology |
Analysis on Interface Diffusion-Induced Embrittlement Between Tungsten and Graphite with Reactive Diffusion Barrier Model
| 2230 |
| 2019 | IAEA CRP report |
Evaluation of tritium inventory in irradiated tungsten by atomic-scale modeling
| 601 |
| 1992 | IEEE Transactions On Plasma Science |
Double Layer-Relevant Laboratory Results
| 3780 |
| 2001 | IEEE Transactions On Plasma Science |
Scaling Characteristics of Plasma Parameters for Low-Pressure Oxygen RF Discharge plasmas
| 4185 |
| 2011 | IEEE TRANSACTIONS ON PLASMA SCIENCE |
Hydroxyl Radical Generation on Bubble Surface of Aqua-Plasma Discharge
| 7399 |
| 2014 | IEEE TRANSACTIONS ON PLASMA SCIENCE |
Characteristics of OH* Generation in Pin-to-Electrolyte Discharges
| 1138 |
| 2015 | IEEE TRANSACTIONS ON PLASMA SCIENCE |
Bullet Velocity Distribution of a Helium Atmospheric-Pressure Plasma Jet in Various N2/O2 Mixed Ambient Conditions
| 1209 |
| 2015 | IEEE TRANSACTIONS ON Semiconductor Manufacturing |
Enhancement of the Virtual Metrology Performance for Plasma-assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters
| 4189 |
| 2018 | IEEE Transactions on Semiconductor Manufacturing |
Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables
| 28202 |
| 2017 | International Journal of Refractory Metals & Hard Materials |
Fabrication of sintered tungsten by spark plasma sintering and investigation of thermal stability
| 2968 |
| 2016 | International Journal of Refractory Metals and Hard Materials |
Improvement of mechanical property of air plasma sprayed tungsten film using pulsed electric current treatment
| 3184 |
| 2015 | J. Phys. D: Appl. Phys. |
Determination of electron energy distribution function shape for non-Maxwellian plasmas using floating harmonics method
| 3275 |
| 2001 | Japanese journal of applied physics |
Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate
| 4941 |
