| 2001 | Surface & Coating Technology |
The measurement of nitrogen ion species ratio in the inductively coupled plasma source ion implantation
| 7059 |
| 2001 | Surface & Coating Technology |
Measurement of sheath expansion in plasma source ion implantation
| 9760 |
| 2019 | Scientific Reports |
Quantitation of the ROS production in plasma and radiation treatments of biotargets
| 935 |
| 2016 | Science of Advanced Materials |
Characteristics of Molybdenum as a Plasma-Generating Electrode
| 1825 |
| 1993 | Review of scientific instruments |
Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe
| 4075 |
| 2000 | REVIEW OF SCIENTIFIC INSTRUMENTS |
Effect of harmonic rf fields on the emissive probe characteristics
| 5324 |
| 2008 | Review of Scientific Instruments |
Self-consistent circuit model for plasma source ion implantation
| 6104 |
| 2012 | PLASMA SOURCES SCIENCE AND TECHNOLOGY |
Characteristics of vapor coverage formation on an RF-driven metal electrode to discharge a plasma in saline solution
| 9616 |
| 2017 | Plasma Sources Science and Technology |
Ion-neutral collision effect on ion-ion two-stream-instability near sheath-presheath boundary in two-ion-species plasmas
| 3426 |
| 2022 | Plasma Sources Science and Technology |
Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma
 | 394 |
| 1992 | Plasma Sources Science & Technology |
Measurements of the presheath in an electron cyclotron resonance etching device
| 4630 |
| 2000 | Plasma sources science & technology |
Asymmetric plasma potential fluctuation in an inductive plasma source
| 6002 |
| 2000 | Plasma sources science & technology |
Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas
| 4869 |
| 2004 | Plasma Science, IEEE Transactions on |
Analysis of Langmuir Probe Data Using Wavelet Transform
| 4134 |
| 2019 | Plasma Processes and Polymers |
Cause Analysis of the Faults in HARC Etching Processes by Using the PI-VM Model for OLED Display Manufacturing
| 1308 |
