| 1993 | Journal of Vacuum Science & Technology |
Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma
| 5290 |
| 2009 | Journal of Vacuum Science & Technology |
Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor
| 6373 |
| 2013 | Journal of Thermal Spray Technology |
Effect of Helmholtz Oscillation on Auto-shroud for APS Tungsten Carbide Coating
| 3353 |
| 2001 | Journal of the Korean Physical Society |
Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma
| 16347 |
| 2006 | Journal of the Korean Physical Society |
Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor
| 6535 |
| 2006 | Journal of the Korean Physical Society |
Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process
| 7306 |
| 2006 | Journal Of The Korean Physical Society |
Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models
| 5697 |
| 2009 | Journal of the Korean Physical Society |
A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma
| 6002 |
| 2012 | Journal of the Korean Physical Society |
Field Emission Characteristics of Cone-shaped Carbon-nanotube Bundles Fabricated Using an Oxygen Plasma
| 4937 |
| 2014 | Journal of the Korean Physical Society |
Characteristics of a Non-Maxwellian Electron Energy Distribution in a Low-pressure Argon Plasma
| 1908 |
| 2016 | Journal of the Korean Physical Society |
Effects of Metastable Species in Helium and Argon Atmospheric Pressure Plasma Jets (APPJs) on Inactivation of Periodontopathogenic Bacteria
| 1815 |
| 2016 | Journal of the Korean Physical Society |
Observation of Oversaturation-Induced Defect Formation in Tungsten Irradiated by Low Energy Deuterium Ion
| 946 |
| 2021 | Journal of the Korean Physical Society |
Phenomenology-based Model Predictive Control of Electron Density in Ar/SF6 Capacitively Coupled Etch Plasma
| 321 |
| 2022 | Journal of the Korean Physical Society |
Plasma Information-based virtual metrology (PI-VM) and mass production process control
 | 673 |
| 2014 | Journal of Physics D: Applied Physics |
Standing wave effect on plasma distribution in an inductively coupled plasma source with a short antenna
| 6215 |
