| 2010 | Thin Solid Films |
Effects of argon and oxygen flow rate on water vapor barrier properties of silicon oxide coatings deposited on polyethylene terephthalate by plasma enhanced chemical vapor deposition
| 8132 |
| 1998 | Physics of Plasmas |
Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field
| 7625 |
| | |
플라즈마내 입자의 하전 특성에 관한 연구
 | 7496 |
| 2011 | IEEE TRANSACTIONS ON PLASMA SCIENCE |
Hydroxyl Radical Generation on Bubble Surface of Aqua-Plasma Discharge
| 7399 |
| 2006 | Journal of the Korean Physical Society |
Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process
| 7306 |
| 2000 | Applied physics letters |
Influence of Electrode-Size Effects on Plasma Sheath Expansion
| 7298 |
| 2006 | Contributions to Plasma Physics |
In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source
| 7183 |
| 2001 | Surface & Coating Technology |
The measurement of nitrogen ion species ratio in the inductively coupled plasma source ion implantation
| 7059 |
| 1997 | Surface & Coating Technology |
Polymer Surface Modification by Plasma Source Ion Implantation
| 6958 |
| 2010 | Carbon |
Mechanism of cone-shaped carbon nanotube bundle formation by plasma treatment
| 6819 |
| 2019 | 반도체디스플레이기술학회지 |
할로겐 플라즈마에 의한 Ge2Sb2Te5 식각 데미지 연구
| 6771 |
| 2006 | Journal of the Korean Physical Society |
Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor
| 6535 |
| 2009 | Journal of Vacuum Science & Technology |
Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor
| 6373 |
| 2004 | Key Engineering Materials |
Measurement of Monodisperse Particle Charge in DC Plasma
| 6273 |
| 2014 | Journal of Physics D: Applied Physics |
Standing wave effect on plasma distribution in an inductively coupled plasma source with a short antenna
| 6215 |
