연도 저널명 제목 조회 수
1993  Journal of Vacuum Science & Technology  Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma 5290
2007  Physics of Plasmas  Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation 5176
2013  Journal of Applied Physics  Low-energy D+ and H+ ion irradiation effects on highly oriented pyrolytic graphite 4983
2001  Japanese journal of applied physics  Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate 4941
2012  Journal of the Korean Physical Society  Field Emission Characteristics of Cone-shaped Carbon-nanotube Bundles Fabricated Using an Oxygen Plasma 4937
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4869
1999  Journal of aerosol science  Charge measurement on monodisperse particles in a DC glow discharge plasma 4650
1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4630
1993  Journal of Vacuum Science & Technology  Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device 4601
2006  Japanese Journal of Applied Physics  Investigation of Current on the Conducting Target Biased with a Large Negative Potential in the Non-Uniform Plasma 4536
2004  Surface and Coatings Technology  Time-resolved plasma measurement in a high-power pulsed ICP source for large area 4509
    정전 탐침을 이용한 유도 결합형 반응기에서 발생하는 산소 플라즈마의 특성연구 file 4472
    The operation properties of DBD reactors in air pressure with varying the capacitance of reactors file 4457
2006  Japanese Journal of Applied Physics  Etching of Multi-Walled Carbon Nanotubes Using Energetic Plasma Ions 4305
    유한오름시간을 갖는 음전위 펄스에서 시변환 플라즈마 덮개의 거동연구 file 4286

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