- Plasma in general
- Plasma Source
- Chamber component
- Monitoring Method
Plasma in general Co-relation between RF Forward power and Vpp
I am working on a ALD (Atomic layer deposition) product wherein we are processing multiple wafers in the single reactor.
When we supply RF power to one of the reactor (i.e. REACTOR 1), the other reactor (REACTOR 2) beside reactor 1 is showing high Vpp value. We are not supplying RF power to reactor 2. (Please note reactor 1 & reactor 2 share the gas flow volume and are not fully isolated)
Why would this be happening ?
What component is Vpp sensor installed on?
If Vpp sensor is attached to the matching network, check if the signal actually comes out from the analog signal. Remove the data cabler and measure it with the DVM on the matching network.
You need to check whether it is actual analog noise or actual measurement, and if it is measured on the matching network, it would be faster to test the replacement. Check if Match and GND are connected (signal GND, Match GND)
If there is a separate VI probe, you should suspect that there is a floating circuit.
It seems to be an RF ground issue, and check it.