Plasma in general Co-relation between RF Forward power and Vpp
2022.04.27 17:35
Hello,
I am working on a ALD (Atomic layer deposition) product wherein we are processing multiple wafers in the single reactor.
When we supply RF power to one of the reactor (i.e. REACTOR 1), the other reactor (REACTOR 2) beside reactor 1 is showing high Vpp value. We are not supplying RF power to reactor 2. (Please note reactor 1 & reactor 2 share the gas flow volume and are not fully isolated)
Why would this be happening ?
It seems to be an RF ground issue, and check it.