연도 1993 
저널명 Review of scientific instruments 
 

Plasma flow velocity was determined experimentally from the time delay between fluctuations measured by two spatially separated Langmuir probes in both subsonic and supersonic, steady‐state, unmagnetized plasma flows.  


http://dx.doi.org/10.1063/1.1144471

연도 저널명 제목 조회 수
2002  Surface and Coatings Technology  The effect of plasma exposure and annealing atmosphere on shallow junction formation using plasma source ion implantation 5369
1993  Journal of Vacuum Science & Technology  Role of contaminants in electron cyclotron resonance plasmas 5393
2016  Fusion Engineering and Design  Deuterium ion irradiation induced blister formation and destruction 5572
2001  Journal of applied physics  Electrostatic probe diagnostic of a planar type radio-frequency inductively coupled oxgen plasma 5657
2006  Journal Of The Korean Physical Society  Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models 5706
2009  Journal of Applied Physics  Plasma uniformity and phase-controlled etching in a very high frequency capacitive discharge 5767
    3-5mm 강판절단용 아크 플라즈마 절단기 팁 개발 file 5929
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 5973
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6010
2009  Journal of the Korean Physical Society  A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma 6026
2006  Transactions on Electrical and Electronic Materials  SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge 6052
2008  Review of Scientific Instruments  Self-consistent circuit model for plasma source ion implantation 6114
2014  Journal of Physics D: Applied Physics  Standing wave effect on plasma distribution in an inductively coupled plasma source with a short antenna 6230
2004  Key Engineering Materials  Measurement of Monodisperse Particle Charge in DC Plasma 6278
2009  Journal of Vacuum Science & Technology  Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor 6408

Archives


XE Login