연도 1993 
저널명 Review of scientific instruments 
 

Plasma flow velocity was determined experimentally from the time delay between fluctuations measured by two spatially separated Langmuir probes in both subsonic and supersonic, steady‐state, unmagnetized plasma flows.  


http://dx.doi.org/10.1063/1.1144471

연도 저널명 제목 조회 수
2024  Current Applied Physics  Observation of the floating sheath distribution on Al2O3 and silicon targets adjacent to a DC biased metal substrate 80
2022  Current Applied Physics  Investigation of ion-induced etch damages on trench surface of Ge2Sb2Te5 in high density Ar/SF6 plasma 269
2022  Plasma Sources Science and Technology  Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma file 404
2022  Journal of Alloys and Compounds  Competitive roles of dislocations on blister formation in polycrystalline pure tungsten file 441
2022  Journal of the Korean Physical Society  Plasma Information-based virtual metrology (PI-VM) and mass production process control file 684
2022  Physics of Plasma  2022 Review of Data-Driven Plasma Science file 812
2021  Journal of the Korean Physical Society  Phenomenology-based Model Predictive Control of Electron Density in Ar/SF6 Capacitively Coupled Etch Plasma 321
2021  Current Applied Physics  Development of Model Predictive Control of Fluorine Density in SF6/O2/Ar Etch Plasma by Oxygen Flow Rate 441
2021  Atoms  Population Kinetics Modeling of Low-Temperature Argon Plasma 655
2021  반도체디스플레이기술학회지  VHF-CCP 설비에서 Ar/SF6 플라즈마 분포가 Si 식각 균일도에 미치는 영향 분석 810
2021  Materials  Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma 1661
2020  Physics of Plasmas  Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM 3789
2019  IAEA CRP report  Evaluation of tritium inventory in irradiated tungsten by atomic-scale modeling 601
2019  Current Applied Physics  Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth 628
2019  Scientific Reports  Quantitation of the ROS production in plasma and radiation treatments of biotargets 935

Archives


XE Login