연도 2009 
저널명 Journal of the Korean Physical Society 
 

A new algorithm to analyze the digitized Langmuir probe (LP) data is developed with the wavelet transforms, providing the electron energy distribution function (EEDF) for bi-Maxwellian plasmas. Because most of algorithms to analyze the probe data have been developed with the Druyvesteyn formula which is based on the second derivation of current with respect to probe voltage, the accuracy of analysis is very sensitive to the noise level during the derivation of probe data. Especially the amount of hot electrons in the bi-Maxwellian plasma is small enough to compare the noise level and the noise filtering method is a kernel in the development of the algorithm to analyze the bi-Maxwellian EEDF. Here, the bi-orthogonal wavelet and continuous wavelet transforms are chosen for the de-noising and the differentiation processes respectively. It has an advantage to provide the filtered data with minimum loss of important information. The artificial LP data sets composed of electrons were generated with various bulk and hot temperatures and the developed algorithm was evaluated for the various white noise levels. For the case that the noise levels are 10 times of ion saturation current, the plasma parameters such as the population of hot electrons and the temperatures of hot and bulk electron were accurately analyzed within only a few percent deviations from the input values for the generation of artificial probe data. As the demonstration of the algorithm, the analysis of probe data was carried out for the DC glow and the inductively coupled plasmas (ICP) with various input powers and operating pressures, respectively. From the EEDF analyses of those plasmas, the variation of hot electrons in the DC plasma and the Ramsauer effect of low pressure ICP could be observed clearly.


 10.3938/jkps.55.1825

연도 저널명 제목 조회 수
2009  Journal of the Korean Physical Society  A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma 6687
2009  Journal of Korean Physical Society  Effect of Bias Frequency on the Accuracy of Floating Probe Measurements 8687
2009  Journal of Vacuum Science & Technology  Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor 6734
2008  Review of Scientific Instruments  Self-consistent circuit model for plasma source ion implantation 6433
2007  Physics of Plasmas  Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation 5433
2006  Transactions on Electrical and Electronic Materials  SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge 6308
2006  Contributions to Plasma Physics  In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source 7404
2006  Japanese Journal of Applied Physics  Etching of Multi-Walled Carbon Nanotubes Using Energetic Plasma Ions 4480
2006  Japanese Journal of Applied Physics  Investigation of Current on the Conducting Target Biased with a Large Negative Potential in the Non-Uniform Plasma 4969
2006  Journal of the Korean Physical Society  Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor 6707
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2004  Plasma Science, IEEE Transactions on  Analysis of Langmuir Probe Data Using Wavelet Transform 4506
2004  Key Engineering Materials  Measurement of Monodisperse Particle Charge in DC Plasma 6684

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