Abstract

 The plasma density distribution in between the electrode and lateral wall of a narrow gap CCP was investigated. The
plasma density distribution was obtained using single Langmuir probe, having two peaks of density distribution at the
center of electrode and at the peripheral area of electrodes. The plasma density distribution was compared with the RF
fluctuation of plasma potential taken from capacitive probe. Ionization reactions obtained from numerical analysis using
CFD-ACE+ fluid model based code. The peaks in two region for plasma density and voltage fluctuation have similar spatial
distribution according to input power. It was found that plasma density distribution between the electrode and the lateral
wall is closely related with the local ionization.

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