연도 2016 
저널명 Journal of the Korean Physical Society 
 

Abstract


The type of induced material damage in the tungsten irradiated by using deuterium ions was investigated for various value of the fluence at low energy. Experiments were carried out in an electron cyclotron resonance (ECR) plasma source that provided an ion flux of 2.8 × 1021 D+2 /m2s and a sheath energy of 100 eV/D+ 2 on the tungsten target. The energy of irradiated ions was much smaller than the threshold energy for generating cascade collisional damage (∼ 250 eV) in tungsten and was similar of the plasma at the first wall of KSTAR. The target temperature was kept as 700 − 800 K by using an active cooling system. Secondary ion mass spectroscopy (SIMS) was employed to observe the depth profiles of deuterium. The peak of the trapped deuterium concentration in the irradiated tungsten was located near 16 − 17 nm for 2.0 − 4.0 × 1025 D2/m2, which is far deeper than the 1.6 nm for ion implantation at 100 eV/D+ 2 ions. Thermal desorption spectroscopy (TDS) data were analyzed to determine the binding energy (Eb = 1.45 eV) of trapped deuterium, which corresponded to an oversaturation-induced vacancy. This observation is very important for understanding the refueling property of the retained deuterium during steady-state fusion plasma operation.


DOI: 10.3938/jkps.69.518


https://link.springer.com/article/10.3938/jkps.69.518

연도 저널명 제목 조회 수
    플라즈마 이온주입 방법에 의한 질화철 제조 및 자기적 성질 file 8223
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7634
    플라즈마내 입자의 하전 특성에 관한 연구 file 7498
2011  IEEE TRANSACTIONS ON PLASMA SCIENCE  Hydroxyl Radical Generation on Bubble Surface of Aqua-Plasma Discharge 7432
2006  Journal of the Korean Physical Society  Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process 7312
2000  Applied physics letters  Influence of Electrode-Size Effects on Plasma Sheath Expansion 7308
2006  Contributions to Plasma Physics  In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source 7191
2001  Surface & Coating Technology  The measurement of nitrogen ion species ratio in the inductively coupled plasma source ion implantation 7065
1997  Surface & Coating Technology  Polymer Surface Modification by Plasma Source Ion Implantation 6963
2019  반도체디스플레이기술학회지  할로겐 플라즈마에 의한 Ge2Sb2Te5 식각 데미지 연구 6852
2010  Carbon  Mechanism of cone-shaped carbon nanotube bundle formation by plasma treatment 6837
2006  Journal of the Korean Physical Society  Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor 6539
2009  Journal of Vacuum Science & Technology  Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor 6408
2004  Key Engineering Materials  Measurement of Monodisperse Particle Charge in DC Plasma 6278
2014  Journal of Physics D: Applied Physics  Standing wave effect on plasma distribution in an inductively coupled plasma source with a short antenna 6230

Archives


XE Login