연도 2019 
저널명 Plasma Physics and Controlled Fusion 
Plasma Phys. Control. Fusion 

Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing

주저자: Seolhye Park

S. Park, Plasma Phy. Control. Fusion 61 (2019) 014032 (9pp)

연도 저널명 제목 조회 수
2015  Physics of Plasmas  Global model analysis of negative ion generation in low-pressure inductively coupled hydrogen plasmas with bi-Maxwellian electron energy distributions 1051
2017  Physics of Plasmas  Bullet-to-streamer transition on the liquid surface of a plasma jet in atmospheric pressure 1278
2020  Physics of Plasmas  Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM 3867
2007  Physics of Plasmas  Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation 5358
1995  Physics of Plasmas  Magnetic and Collisional Effects on Presheaths 6027
1998  Physics of Plasmas  Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field 7706
2019  Plasma Physics and Controlled Fusion  Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing 1219
2019  Plasma Processes and Polymers  Cause Analysis of the Faults in HARC Etching Processes by Using the PI-VM Model for OLED Display Manufacturing 1341
2004  Plasma Science, IEEE Transactions on  Analysis of Langmuir Probe Data Using Wavelet Transform 4276
1992  Plasma Sources Science & Technology  Measurements of the presheath in an electron cyclotron resonance etching device 4684
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 4912
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6069
2022  Plasma Sources Science and Technology  Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma file 584
2017  Plasma Sources Science and Technology  Ion-neutral collision effect on ion-ion two-stream-instability near sheath-presheath boundary in two-ion-species plasmas 3545
2012  PLASMA SOURCES SCIENCE AND TECHNOLOGY  Characteristics of vapor coverage formation on an RF-driven metal electrode to discharge a plasma in saline solution 9712

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