Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing

2019.07.24 10:50

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연도 2019 
저널명 Plasma Physics and Controlled Fusion 
쪽 - 
Plasma Phys. Control. Fusion 

Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing

주저자: Seolhye Park

S. Park, Plasma Phy. Control. Fusion 61 (2019) 014032 (9pp)

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