연도 2018 
저널명 IEEE Transactions on Semiconductor Manufacturing 
232-241 
Abstract—A phenomenological-based virtual metrology (VM) technique is developed for predicting the silicon nitride film thickness in multi-layer plasma-enhanced chemical vapor deposition (PECVD). Particularly, the analysis of optical emission spectroscopy based on the excitation kinetics in nitrogen plasma is used to develop novel variables, named plasma-information (PI) variables. One variable, PIWall, is determined by analyzing the light transmittances of the nitrogen emissions at the contaminated window, representing the drift of reactor-wall condition. The other variable, PIVolume, is determined by analyzing vibrational distribution of N2(C, ν = 0 − 4) states, representing the drift of plasma density and temperature. These PI variables are applied as part of input variables of VM to improve the prediction accuracy. The partial least squares regression is adopted as the statistical method and the contribution of PI variables on the VM are evaluated through the variable influence evaluation on projection. It demonstrates the necessity of PI variables in VM for PECVD and the reactor-wall condition is a major cause of drift in PECVD.

연도 저널명 제목 조회 수
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2021  Journal of the Korean Physical Society  Phenomenology-based Model Predictive Control of Electron Density in Ar/SF6 Capacitively Coupled Etch Plasma 208
2021  Atoms  Population Kinetics Modeling of Low-Temperature Argon Plasma 363
2021  Materials  Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma 1038
2020  Physics of Plasmas  Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM 3644
2019  Scientific Reports  Quantitation of the ROS production in plasma and radiation treatments of biotargets 793
2019  반도체디스플레이기술학회지  할로겐 플라즈마에 의한 Ge2Sb2Te5 식각 데미지 연구 2966
2019  반도체디스플레이기술학회지  플라즈마 정보인자를 활용한 SiO2 식각 깊이 가상 계측 모델의 특성 인자 역할 분석 960
2019  Journal of Periodontal & Implant Science  The bactericidal effect of an atmospheric-pressure plasma jet on Porphyromonas gingivalis biofilms on sandblasted and acid-etched titanium discs 1010

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