| 2021 | Atoms |
Population Kinetics Modeling of Low-Temperature Argon Plasma
| 1774 |
| 2021 | Journal of the Korean Physical Society |
Phenomenology-based Model Predictive Control of Electron Density in Ar/SF6 Capacitively Coupled Etch Plasma
| 782 |
| 2021 | Current Applied Physics |
Development of Model Predictive Control of Fluorine Density in SF6/O2/Ar Etch Plasma by Oxygen Flow Rate
| 1837 |
| 2021 | 반도체디스플레이기술학회지 |
VHF-CCP 설비에서 Ar/SF6 플라즈마 분포가 Si 식각 균일도에 미치는 영향 분석
| 1945 |
| 2020 | Physics of Plasmas |
Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM
| 4219 |
| 2019 | Plasma Processes and Polymers |
Cause Analysis of the Faults in HARC Etching Processes by Using the PI-VM Model for OLED Display Manufacturing
| 1540 |
| 2019 | Plasma Physics and Controlled Fusion |
Application of of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing
| 1422 |
| 2019 | Current Applied Physics |
Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth
| 860 |
| 2019 | IAEA CRP report |
Evaluation of tritium inventory in irradiated tungsten by atomic-scale modeling
| 988 |
| 2019 | Journal of Periodontal & Implant Science |
The bactericidal effect of an atmospheric-pressure plasma jet on Porphyromonas gingivalis biofilms on sandblasted and acid-etched titanium discs
| 1248 |
| 2019 | 반도체디스플레이기술학회지 |
플라즈마 정보인자를 활용한 SiO2 식각 깊이 가상 계측 모델의 특성 인자 역할 분석
| 1667 |
| 2019 | 반도체디스플레이기술학회지 |
할로겐 플라즈마에 의한 Ge2Sb2Te5 식각 데미지 연구
| 7195 |
| 2019 | Scientific Reports |
Quantitation of the ROS production in plasma and radiation treatments of biotargets
| 1331 |
| 2018 | IEEE Transactions on Semiconductor Manufacturing |
Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables
| 28633 |
| 2017 | Physics of Plasmas |
Bullet-to-streamer transition on the liquid surface of a plasma jet in atmospheric pressure
| 4547 |
