| 2012 | Journal of the Korean Physical Society |
Field Emission Characteristics of Cone-shaped Carbon-nanotube Bundles Fabricated Using an Oxygen Plasma
| 4937 |
| 2011 | IEEE TRANSACTIONS ON PLASMA SCIENCE |
Hydroxyl Radical Generation on Bubble Surface of Aqua-Plasma Discharge
| 7399 |
| 2011 | 전기전자재료학회논문지 |
플라즈마 삽입전극의 전류에 미치는 밀도 구배의 영향
| 2772 |
| 2010 | Carbon |
Mechanism of cone-shaped carbon nanotube bundle formation by plasma treatment
| 6819 |
| 2010 | Thin Solid Films |
Effects of argon and oxygen flow rate on water vapor barrier properties of silicon oxide coatings deposited on polyethylene terephthalate by plasma enhanced chemical vapor deposition
| 8132 |
| 2009 | Journal of Applied Physics |
Plasma uniformity and phase-controlled etching in a very high frequency capacitive discharge
| 5746 |
| 2009 | Journal of Korean Physical Society |
Electron Density Monitoring By Using the V-I Phase Difference with a Circuit Model for a kHz Atmospheric-Pressure Dielectric Barrier Discharge
| 10075 |
| 2009 | Journal of the Korean Physical Society |
A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma
| 6002 |
| 2009 | Journal of Korean Physical Society |
Effect of Bias Frequency on the Accuracy of Floating Probe Measurements
| 8536 |
| 2009 | Journal of Vacuum Science & Technology |
Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor
| 6373 |
| 2008 | Review of Scientific Instruments |
Self-consistent circuit model for plasma source ion implantation
| 6104 |
| 2007 | Physics of Plasmas |
Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation
| 5176 |
| 2006 | Transactions on Electrical and Electronic Materials |
SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge
| 6051 |
| 2006 | Contributions to Plasma Physics |
In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source
| 7183 |
| 2006 | Japanese Journal of Applied Physics |
Etching of Multi-Walled Carbon Nanotubes Using Energetic Plasma Ions
| 4305 |
