| 2009 | Journal of the Korean Physical Society |
A New Langmuir Probe Analysis Algorithm Based on Wavelet Transforms to Obtain the Electron Energy Distribution Function of a Bi-Maxwellian Plasma
| 6687 |
| 2009 | Journal of Korean Physical Society |
Effect of Bias Frequency on the Accuracy of Floating Probe Measurements
| 8687 |
| 2009 | Journal of Vacuum Science & Technology |
Effect on plasma and etch-rate uniformity of controlled phase shift between rf voltages applied to powered electrodes in a triode capacitively coupled plasma reactor
| 6734 |
| 2008 | Review of Scientific Instruments |
Self-consistent circuit model for plasma source ion implantation
| 6433 |
| 2007 | Physics of Plasmas |
Variation of plasma parameters on boundary conditions in an inductively coupled plasma source for hyperthermal neutral beam generation
| 5433 |
| 2006 | Transactions on Electrical and Electronic Materials |
SF6 and O2 Effects on PR Ashing in N2 Atmospheric Dielectric Barrier Discharge
| 6308 |
| 2006 | Contributions to Plasma Physics |
In-Situ Method of Monitoring Argon Plasma Density Variation Using Current and Voltage of Flat Antenna in Inductively Coupled Plasma Source
| 7404 |
| 2006 | Japanese Journal of Applied Physics |
Etching of Multi-Walled Carbon Nanotubes Using Energetic Plasma Ions
| 4480 |
| 2006 | Japanese Journal of Applied Physics |
Investigation of Current on the Conducting Target Biased with a Large Negative Potential in the Non-Uniform Plasma
| 4969 |
| 2006 | Journal of the Korean Physical Society |
Capacitance Between an Atmospheric Discharge Plasma and the Dielectric Electrode in the Parallel Cell Reactor
| 6707 |
| 2006 | Journal of the Korean Physical Society |
Optimum Operating Frequency of an Atmospheric-Pressure Dielectric-Barrier Discharge for the Photo-Resistor Ashing Process
| 7699 |
| 2006 | Journal Of The Korean Physical Society |
Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models
| 5875 |
| 2006 | 한국진공학회지 |
PSII 펄스 시스템의 동적 플라즈마 부하 회로 모델 개발
| 8783 |
| 2004 | Plasma Science, IEEE Transactions on |
Analysis of Langmuir Probe Data Using Wavelet Transform
| 4506 |
| 2004 | Key Engineering Materials |
Measurement of Monodisperse Particle Charge in DC Plasma
| 6684 |
