Plasma Density Monitoring Based on the Capacitively- and Inductively-Coupled-Plasma Models
2008.11.07 13:55
연도 | 2006 |
---|---|
저널명 | Journal Of The Korean Physical Society |
쪽 | - |
Journal of the Korean Vacuum Society||2006||49||||S726||S731||Seok-Hwan Lee and Gon-Ho Kim||||
The in-situ monitoring method of plasma density variation in the inductively coupled plasma (ICP) has been developed with the air-core transformer model using the current and voltage of the antenna, which was based on the assumption of input power coupled inductively to the plasma generation (H-mode). In addition to the previous model, the capacitively-coupled-plasma generation (E-mode) is included in this study, improving the accuracy of plasma density monitoring for the variation of operating powers and pressures, respectively. Experiments are conducted with ICP power ranging from 100 to 1500 W and an argon operating pressure of 7 to 40 mTorr, respectively, which are compared to the monitored data, and the feasibility of this monitoring method is demonstrated.