연도 저널명 제목 조회 수
2004  Key Engineering Materials  Measurement of Monodisperse Particle Charge in DC Plasma 6663
2002  Surface and Coatings Technology  The effect of plasma exposure and annealing atmosphere on shallow junction formation using plasma source ion implantation 5762
2002  Journal of Applied Physics  Measurement of expanding plasma sheath from a target baised by a negative pulse with a fast rise time 112496
2001  IEEE Transactions On Plasma Science  Scaling Characteristics of Plasma Parameters for Low-Pressure Oxygen RF Discharge plasmas 4450
2001  Japanese journal of applied physics  Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate 5143
2001  Journal of applied physics  Electrostatic probe diagnostic of a planar type radio-frequency inductively coupled oxgen plasma 6083
2001  Surface & Coating Technology  The measurement of nitrogen ion species ratio in the inductively coupled plasma source ion implantation 7208
2001  Surface & Coating Technology  Measurement of sheath expansion in plasma source ion implantation 10164
2001  Journal of the Korean Physical Society  Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma 16766
2001  Current Applied Physics  Calculation of transport parameters in KT-1 tokamak edge plasma 84291
2000  Plasma sources science & technology  Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas 5194
2000  REVIEW OF SCIENTIFIC INSTRUMENTS  Effect of harmonic rf fields on the emissive probe characteristics 5686
2000  Plasma sources science & technology  Asymmetric plasma potential fluctuation in an inductive plasma source 6396
2000  Applied physics letters  Influence of Electrode-Size Effects on Plasma Sheath Expansion 7485
1999  Physics of Plasma  Ion sheath expansion for a target voltage with a finite risetime 8772

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