| 2001 | Journal of the Korean Physical Society |
Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma
| 16347 |
| 2001 | Current Applied Physics |
Calculation of transport parameters in KT-1 tokamak edge plasma
| 83194 |
| 2000 | Plasma sources science & technology |
Asymmetric plasma potential fluctuation in an inductive plasma source
| 6002 |
| 2000 | REVIEW OF SCIENTIFIC INSTRUMENTS |
Effect of harmonic rf fields on the emissive probe characteristics
| 5324 |
| 2000 | Plasma sources science & technology |
Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas
| 4869 |
| 2000 | Applied physics letters |
Influence of Electrode-Size Effects on Plasma Sheath Expansion
| 7298 |
| 1999 | Journal of aerosol science |
Charge measurement on monodisperse particles in a DC glow discharge plasma
| 4650 |
| 1999 | Physics of Plasma |
Ion sheath expansion for a target voltage with a finite risetime
| 8615 |
| 1998 | Physics of Plasmas |
Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field
| 7625 |
| 1997 | Surface & Coating Technology |
Polymer Surface Modification by Plasma Source Ion Implantation
| 6958 |
| 1995 | Journal of applied physics |
A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool
| 5308 |
| 1995 | Physics of Plasmas |
Magnetic and Collisional Effects on Presheaths
| 5964 |
| 1993 | Review of scientific instruments |
Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe
| 4075 |
| 1993 | Journal of Vacuum Science & Technology |
Role of contaminants in electron cyclotron resonance plasmas
| 5385 |
| 1993 | Journal of Vacuum Science & Technology |
Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device
| 4601 |
