| 2004 | Key Engineering Materials |
Measurement of Monodisperse Particle Charge in DC Plasma
| 6545 |
| 2002 | Surface and Coatings Technology |
The effect of plasma exposure and annealing atmosphere on shallow junction formation using plasma source ion implantation
| 5613 |
| 2002 | Journal of Applied Physics |
Measurement of expanding plasma sheath from a target baised by a negative pulse with a fast rise time
| 111764 |
| 2001 | IEEE Transactions On Plasma Science |
Scaling Characteristics of Plasma Parameters for Low-Pressure Oxygen RF Discharge plasmas
| 4409 |
| 2001 | Japanese journal of applied physics |
Plasma Source Ion Implantation for Ultrashallow Junctions: Low Energy and High Dose Rate
| 5077 |
| 2001 | Journal of applied physics |
Electrostatic probe diagnostic of a planar type radio-frequency inductively coupled oxgen plasma
| 6018 |
| 2001 | Surface & Coating Technology |
The measurement of nitrogen ion species ratio in the inductively coupled plasma source ion implantation
| 7177 |
| 2001 | Surface & Coating Technology |
Measurement of sheath expansion in plasma source ion implantation
| 10110 |
| 2001 | Journal of the Korean Physical Society |
Characterization of Oxygen Plasma by Using the Langmuir Probe in an Inductively Coupled Plasma
| 16632 |
| 2001 | Current Applied Physics |
Calculation of transport parameters in KT-1 tokamak edge plasma
| 84102 |
| 2000 | Plasma sources science & technology |
Design and operation of an Omegatron mass spectrometer for measurements of positive and negative ion species in electron cyclotron resonance plasmas
| 5101 |
| 2000 | REVIEW OF SCIENTIFIC INSTRUMENTS |
Effect of harmonic rf fields on the emissive probe characteristics
| 5599 |
| 2000 | Plasma sources science & technology |
Asymmetric plasma potential fluctuation in an inductive plasma source
| 6335 |
| 2000 | Applied physics letters |
Influence of Electrode-Size Effects on Plasma Sheath Expansion
| 7414 |
| 1999 | Journal of aerosol science |
Charge measurement on monodisperse particles in a DC glow discharge plasma
| 4822 |
