| 1999 | Physics of Plasma |
Ion sheath expansion for a target voltage with a finite risetime
| 8717 |
| 1998 | Physics of Plasmas |
Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field
| 7830 |
| 1997 | Surface & Coating Technology |
Polymer Surface Modification by Plasma Source Ion Implantation
| 7157 |
| 1995 | Journal of applied physics |
A Two-Dimensional Particle-In-Cell Simulation of an Electron-Cyclotron-Resonance Etching Tool
| 5550 |
| 1995 | Physics of Plasmas |
Magnetic and Collisional Effects on Presheaths
| 6152 |
| 1993 | Review of scientific instruments |
Direct Measurement of Plasma Flow Velocity Using a Langmuir Probe
| 4229 |
| 1993 | Journal of Vacuum Science & Technology |
Two-Dimensional Mapping of Plasma Parameters Using Probes in an Electron Cyclotron Resonance Etching Device
| 4747 |
| 1993 | Journal of Vacuum Science & Technology |
Etching Rate Characterization of SiO2 and Si Using In Energy Flux and Atomic Fluorine Density in a CF4/O2/Ar Electron Cyclotron Resonance Plasma
| 5497 |
| 1993 | Journal of Vacuum Science & Technology |
Role of contaminants in electron cyclotron resonance plasmas
| 5520 |
| 1992 | IEEE Transactions On Plasma Science |
Double Layer-Relevant Laboratory Results
| 4087 |
| 1992 | Plasma Sources Science & Technology |
Measurements of the presheath in an electron cyclotron resonance etching device
| 4794 |
