연도 2004 
저널명 Key Engineering Materials 
 

 The experiments are carried out in the system consists of a monodisperse particle generator, a DC magnetized plasma generation system, and a charge measurement system. The plasma chamber is made of cross-shape Pyrex surrounded by magnetic bucket (composed of 12 permanent magnetic bar) to confine the plasma. DC magnetic field up to 9.6G is applied to the plasma zone by external magnetic coil. Previous work showed tha the charging effect clearly increases with increasing the size of the particle and plasma density, as one expected. The result showed that AL2O3 particles in the size ranges of 30nm to 150nm where the number of charge varied fron 20 to 45 elementary charges at the chamber pressure of 1.17 torr. If the magnetic field is applied at the chamger, Al2O3 particle of 50nm in diameter showed that the charge varied from ca. 15 elementary charges to 75 charges as the magnetic field changed from 0 to 9.6G.


10.4028/www.scientific.net/KEM.270-273.855


연도 저널명 제목 조회 수
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2022  Plasma Sources Science and Technology  Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma file 407
2022  Journal of Alloys and Compounds  Competitive roles of dislocations on blister formation in polycrystalline pure tungsten file 442
2022  Journal of the Korean Physical Society  Plasma Information-based virtual metrology (PI-VM) and mass production process control file 685
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2021  Journal of the Korean Physical Society  Phenomenology-based Model Predictive Control of Electron Density in Ar/SF6 Capacitively Coupled Etch Plasma 321
2021  Current Applied Physics  Development of Model Predictive Control of Fluorine Density in SF6/O2/Ar Etch Plasma by Oxygen Flow Rate 443
2021  Atoms  Population Kinetics Modeling of Low-Temperature Argon Plasma 665
2021  반도체디스플레이기술학회지  VHF-CCP 설비에서 Ar/SF6 플라즈마 분포가 Si 식각 균일도에 미치는 영향 분석 814
2021  Materials  Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma 1661
2020  Physics of Plasmas  Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM 3789
2019  IAEA CRP report  Evaluation of tritium inventory in irradiated tungsten by atomic-scale modeling 601
2019  Current Applied Physics  Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth 630
2019  Scientific Reports  Quantitation of the ROS production in plasma and radiation treatments of biotargets 935

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