연도 2015 
저널명 Journal of Nuclear Materials 
 

Abstract


The recrystallization of bulk tungsten is investigated under various thermal loads that are relevant to the accumulation energy during Type-I ELM in ITER H-mode operation. A thermal plasma torch is used to examine only the thermal load effect on the material; therefore, the charge and atomic effects are ignored. In this condition, recrystallization is observed in bulk W with a surface temperature above 1700 C. The effect becomes severe with a finite recrystallization thickness near the surface, which introduces vertical cracking along grain boundaries with increasing thermal load. However, plasma-sprayed tungsten (PS-W) is not crystallized because neighboring lamellas merge, destroying their interlayer and producing no vertical cracks. This is attributed to an annealing effect in PS-W. Therefore, these results suggest that a multilayer W structure is advantageous in the fabrication of W, especially for long pulse operation in a future fusion reactor.


https://doi.org/10.1016/j.jnucmat.2014.12.002

연도 저널명 제목 조회 수
2024  Current Applied Physics  Observation of the floating sheath distribution on Al2O3 and silicon targets adjacent to a DC biased metal substrate 97
2022  Current Applied Physics  Investigation of ion-induced etch damages on trench surface of Ge2Sb2Te5 in high density Ar/SF6 plasma 275
2022  Plasma Sources Science and Technology  Investigation of ion collision effect on electrostatic sheath formation in weakly ionized and weakly collisional plasma file 412
2022  Journal of Alloys and Compounds  Competitive roles of dislocations on blister formation in polycrystalline pure tungsten file 442
2022  Journal of the Korean Physical Society  Plasma Information-based virtual metrology (PI-VM) and mass production process control file 693
2022  Physics of Plasma  2022 Review of Data-Driven Plasma Science file 817
2021  Journal of the Korean Physical Society  Phenomenology-based Model Predictive Control of Electron Density in Ar/SF6 Capacitively Coupled Etch Plasma 321
2021  Current Applied Physics  Development of Model Predictive Control of Fluorine Density in SF6/O2/Ar Etch Plasma by Oxygen Flow Rate 444
2021  Atoms  Population Kinetics Modeling of Low-Temperature Argon Plasma 672
2021  반도체디스플레이기술학회지  VHF-CCP 설비에서 Ar/SF6 플라즈마 분포가 Si 식각 균일도에 미치는 영향 분석 828
2021  Materials  Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma 1661
2020  Physics of Plasmas  Predictive Control of the Plasma Processes in the OLED Display Mass Production Referring to the Discontinuity Qualifying PI-VM 3789
2019  IAEA CRP report  Evaluation of tritium inventory in irradiated tungsten by atomic-scale modeling 601
2019  Current Applied Physics  Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth 630
2019  Scientific Reports  Quantitation of the ROS production in plasma and radiation treatments of biotargets 936

Archives


XE Login